| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a material for forming a resist protective film with which deterioration of a resist film during liquid immersion lithography using water or other various liquids for liquid immersion lithography and deterioration of the liquid for liquid immersion lithography itself are simultaneously prevented in a liquid immersion lithography process, and with which durability for storage in an amine-containing atmosphere after exposure and before developmant of the resist film is improved without increasing the number of steps of processing. <P>SOLUTION: The material for forming the protective film is constructed by making the material contain at least water or an alkali soluble polymer component, and alcohol containing a fluorine atom. <P>COPYRIGHT: (C)2007,JPO&INPIT |
