发明名称 STAGE EQUIPMENT AND ALIGNER
摘要 <P>PROBLEM TO BE SOLVED: To obtain stage equipment and an aligner in which high precision movement of a stage is achieved. <P>SOLUTION: Since an auxiliary counter mass 75 moves such that the centroidal position of a reticle stage RST movable at least in the direction of Y axis coincides with the centroidal position of a counter mass 20 moving reversely to the reticle stage through reaction to movement of the reticle stage in the direction of Y axis, centroid of the reticle stage coincides with that of the counter mass when a driving force acts on the centroid of the reticle stage and thereby reaction incident to movement of the reticle stage can act on the centroid of the counter mass. Since a torque in the rotational direction is not generated in the counter mass in the horizontal plane, high precision movement of the stage is achieved without affected by rotation of the counter mass. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006303312(A) 申请公布日期 2006.11.02
申请号 JP20050125272 申请日期 2005.04.22
申请人 NIKON CORP 发明人 TANAKA KEIICHI
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
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