LIGHT-SHIELDING/ANTIREFLECTION MULTILAYER FILM, METHOD FOR FORMING THE SAME, SOLID-STATE IMAGING ELEMENT HAVING THE SAME, AND MANUFACTURING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a light-shielding/antireflection multilayer film which has satisfactory linearity of a film edge and is excellent in weatherability, to provide a solid-state imaging element which can reduce occurrence of spurious signals caused by stray light and is free from color defect, and to provide a simplified manufacturing method of the solid-state imaging element.

SOLUTION: The light-shielding/antireflection multilayer film is made by laminating: a light-shielding film comprising a metal thin film or a metal compound thin film; and an antireflection film directly formed on the light-shielding film, wherein the antireflection film contains a black coloring agent having an average primary particle size of 30 nm or less.

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