| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a resist recovering apparatus in which (1) resist recovering efficiency is enhanced, so that the lifetime of an alkali solution is extended and cleaning work is made simple and easy, (2) it is made unnecessary to add a defoaming agent, so that the occurrence of a defective circuit board is prevented, (3) clogging is prevented, so that mesh density can be made high, and (4) the apparatus is made smaller in size. <P>SOLUTION: The resist recovering apparatus 11 is used in a process of producing a circuit board to separate and recover a photosensitive resist A from a mixture D of the resist A and an alkali solution B, and comprises a liquid pre-removal section 13, a resist concentration section 14, a resist recovery section 15 and a scum recovery section 30. In the liquid pre-removal section 13, the alkali solution B is separated and recovered from the mixture D. In the resist concentration section 14, the resist A is concentrated and the alkali solution B is separated and recovered. In the resist recovery section 15, the resist A is collected and recovered and the the alkali solution B is separated and recovered. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
