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发明名称
method for forming gate electrode of semiconductor device
摘要
申请公布号
KR100640943(B1)
申请公布日期
2006.11.02
申请号
KR20040109566
申请日期
2004.12.21
申请人
发明人
分类号
H01L29/78
主分类号
H01L29/78
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