| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a drawing device capable of correcting drawing data correctly, according to the complex deformations of the substrate. <P>SOLUTION: When the substrate, on which a pattern is drawn, is deformed in a complex manner of causing a second deformed substrate 46, a pattern drawing region of originally square shape turns into a second deformed pattern drawing region 47, which is a quadrangle formed by first to fourth alignment marks M<SB>1</SB>-M<SB>4</SB>. Thus, by imparting a scaling correction and a shaft tilt correction to the drawing data, expressing a position and a shape of the pattern to be drawn, a data corresponding to a parallelogram first deformed pattern drawing region 43 is generated. Furthermore, according to a gradual scaling, with which a certain point in a two-dimensional coordinate system is converted into a new point by adding a value proportional to the other coordinate value to the x-coordinate value or to the y-coordinate value, a corrected drawing data, corresponding to the second deformed pattern drawing region 47, are generated. The drawing device draws the pattern in the second deformed pattern drawing region 47, based on the corrected drawing data. <P>COPYRIGHT: (C)2007,JPO&INPIT |
