MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD

摘要

A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light, and a diffraction grating for splitting the measuring light that has passed the pinhole mask and the optical system, wherein Lg = m · Pg<SUP>2</SUP> / ? is met, where Pg is a grating pitch of the diffraction grating, ? is a wavelength of the measuring light, m is an integer other than 0, and Lg is a distance between the diffraction grating and an image plane of the optical system, and wherein the measuring apparatus calculates a wavefront aberration of the optical system from an interferogram formed by causing interference of the measuring light split by the diffraction grating.