| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition excellent in sensitivity, resolving power and profile. <P>SOLUTION: The resist composition contains a specified sulfonium compound which contains a group having a -CON- bond or a -SO<SB>2</SB>N- bond and generates an acid upon irradiation with an actinic ray or a radiation. <P>COPYRIGHT: (C)2004,JPO |
