Cerium oxide polishing particles, slurry for CMP, methods for preparing the same, and methods for polishing substrate,申请号KR20040064226-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Cerium oxide polishing particles, slurry for CMP, methods for preparing the same, and methods for polishing substrate
摘要
申请公布号	KR100640583(B1)	申请公布日期	2006.10.31
申请号	KR20040064226	申请日期	2004.08.16
申请人		发明人
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

您可能感兴趣的专利

QUICK CLAMP OF WORKING TOOLS FOR SMALL LOADERS

KNITTED SIMULATED FUR WITHOUT BACK COATING

TRANSPARENT VARNISH

AUTOMATIZED AND ROBOTIZED STORING SYSTEM

WASTE WATERS OUTLET FROM SUPERSTRUCTURE

WATER PURIFICATION PLANT

COALESCENT SEPARATOR

GRINDING AUTOMATON

ELECTRODE FOR BUILDINGS DRYING

AUTOMATICALLY CONTROLLED CORRELATION SPECTROMETER WITH POSITIONS' ELIMINATED BEAM

method of fungal glucan insulation

SYNCHRONOUS TRANSMITTING SYSTEM

DEVICE FOR SUBSTRATE'S STEAMING OR, IF NEED BE, CULTIVATION

METHOD OF MICROELECTRONIC COMPONENT'S SELECTED PARAMETER'S TEMPERATURE COEFFICIENT ADJUSTMENT

ROTATING TOOL FOR GRINDING ESPECIALLY SEMICONDUCTOR SYSTEMS' FACETS

TWO-PART COUPLING OF TEST BARS WITH FLAT HEAD FOR SERIES FATIQUE TEST

METHOD OF TECHNICAL N-BUTOXYMETHYLACRYLAMIDE OR N-ISOBUTOXYMETHYLACRYLAMIDE PRODUCTION

QUICK MEASURING HIGH-TENSION SOURCE

CONNEXION FOR LIQUID SUBSTANCES' APPLICATORS DOSING SYNCHRONIZATION WITH WORKING SPEED