发明名称 |
Positive resist containing naphthol functionality |
摘要 |
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation are obtained using a polymer having acrylate/methacrylate monomeric units comprising a naphthol ester group. The resist may optionally contain polymer having acrylate/methacrylate monomeric units with fluorine-containing functional groups. The resists containing the polymer having acrylate/methacrylate monomeric units comprising a naphthol ester group have an improved process window, including improved etch resistance and reduced swelling compared to conventional fluorine-containing 193 nm resist.
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申请公布号 |
US7129016(B2) |
申请公布日期 |
2006.10.31 |
申请号 |
US20040987540 |
申请日期 |
2004.11.12 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
KHOJASTEH MAHMOUD;CHEN KUANG-JUNG;VARANASI PUSHKARA RAO |
分类号 |
G03F7/039;G03F7/30 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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