发明名称 |
Stage control method, a stage control system, and a semiconductor manufacturing equipment |
摘要 |
A method of controlling a stage comprising: acquiring a first moving speed of the stage based upon position information from a laser interferometer for measuring a position of the stage; controlling the moving speed of the stage based upon the first speed; determining a second moving speed of the stage based upon the number of rotation of a motor for moving the stage; controlling the moving speed of the stage based upon the second moving speed; and acquiring a ratio of the second moving speed to the first moving speed based upon the first moving speed.
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申请公布号 |
US7130026(B2) |
申请公布日期 |
2006.10.31 |
申请号 |
US20050047675 |
申请日期 |
2005.02.02 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
SUGAWARA TSUKASA;FUJII AKIRA |
分类号 |
G03B27/58;H01L21/68;G03B27/32;H01L21/027;H02P1/00 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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