发明名称 Integrated mask
摘要 An integrated mask structure for a substrate, the structure comprising a pillar structure formed on the substrate, and at least one gap structure extending along the pillar structure, wherein a portion of a wall surface of each gap structure is not in a line of sight from outside of the gap structure, said portion of the wall surface extending along the pillar structure.
申请公布号 SG125973(A1) 申请公布日期 2006.10.30
申请号 SG20050001482 申请日期 2005.03.09
申请人 AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH 发明人 HUANG ZHAOHONG;QI GUOJUN;ZENG XIANTING
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