| 发明名称 |
Supporting structure for use in a lithographic apparatus |
| 摘要 |
The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure maybe a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus maybe cleaned with one single substrate only.
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| 申请公布号 |
SG125948(A1) |
申请公布日期 |
2006.10.30 |
| 申请号 |
SG20040001666 |
申请日期 |
2004.03.26 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
TINNEMANS PATRICIUS ALOYSIUS JACOBUS;BUIS EDWIN JOHAN;DONDERS SJOERD NICOLAAS LAMBERTUS;ELP VAN JAN;HOOGKAMP JAN FREDERIK;MEER VAN ASCHWIN LODEWIJK HENDRICUS JOHANNES;SMULDERS PATRICK JOHANNES CORNELUS HENDRIK;SPNAJERS FRANCISCUS ANDREAS CORNELIS JOHANNES;VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS;VISSER RAIMOND;TEGENBOSCH HENRICUS GERARDUS;BERG VAN DEN JOHANNES CHARLES ADRIANUS;SANDE VAN DE HENRICUS JOHANNES ADRIANUS;VERVOORT THIJS |
| 分类号 |
B08B1/00;B25J13/08;B65G49/07;G03F7/20;H01L21/027;H01L21/304;H01L21/677;H01L21/68;H01L21/683;H02N13/00 |
主分类号 |
B08B1/00 |
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