发明名称 MASK, MANUFACTURING METHOD FOR MASK, MANUFACTURING APPARATUS FOR MASK, METHOD FOR MAKING FILM OF LIGHT-EMITTING MATERIAL, ELECTROOPTICAL APPARATUS AND ELECTRONIC APPARATUS
摘要 This mask includes: a substrate in which an aperture is formed; a mask member which, along with being formed with a plurality of through holes, is joined to the substrate in correspondence to the aperture; and spacers which hold the substrate and the mask member with a predetermined gap between them.
申请公布号 KR100638161(B1) 申请公布日期 2006.10.27
申请号 KR20060045325 申请日期 2006.05.19
申请人 发明人
分类号 H05B33/10;C23C14/04;C23C14/24;H01L51/50;H05B33/14 主分类号 H05B33/10
代理机构 代理人
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