| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition having high heat resistance, high transparency and a low dielectric constant, capable of forming a cured film with a pattern having high chemical resistance and good resolution, and being used for forming a planarizing film for a TFT substrate, an interlayer insulation film or a core or cladding material of an optical waveguide. <P>SOLUTION: The photosensitive siloxane composition comprises (a) a polysiloxane, (b) a quinonediazido compound, (c) a solvent and (d) a thermally crosslinkable compound. <P>COPYRIGHT: (C)2007,JPO&INPIT |
