APPARATUS AND METHOD FOR SUPERCRITICAL FLUID REMOVAL OR DEPOSITION PROCESSES
摘要
<p>A continuous-flow supercritical fluid (SCF) apparatus and method for the deposition of thin films onto microelectronic devices or the removal of unwanted layers, particles and/or residues from microelectronic devices having same thereon. The SCF apparatus preferably includes a dynamic mixer to ensure homogeneous mixing of the SCF and other chemical components.</p>
申请公布号
WO2006113573(A1)
申请公布日期
2006.10.26
申请号
WO2006US14321
申请日期
2006.04.17
申请人
ADVANCED TECHNOLOGY MATERIALS, INC.;BAUM, THOMAS H.;KORZENSKI, MICHAEL B.;GHENCIU, ELIODOR G.;XU, CHONGYING;VISINTIN, PAMELA M.
发明人
KORZENSKI, MICHAEL B.;GHENCIU, ELIODOR G.;XU, CHONGYING;BAUM, THOMAS H.;VISINTIN, PAMELA M.
