| 摘要 |
<p>Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous, non-corrosive cleaning compositions that resist galvanic corrosion when used on stacked layer structures of different types of metals at a surface of an electronic device. Such non-aqueous photoresist strippers and cleaning compositions comprise: (a) at least one polar organic solvent, (b) at least one di or polyamine having both at least one primary amine group and one or more secondary and/or tertiary amine groups, and having the formula wherein R<SUB>1</SUB>, R<SUB>2</SUB>, R<SUB>4</SUB>, and R<SUB>5</SUB> can be independently selected from H, OH, hydroxyalkyl and aminoalkyl groups; R<SUB>6</SUB>and R<SUB>7 </SUB>are each independently H or alkyl groups, and m and n are each independently integers of 1 or larger, with the proviso that R<SUB>1</SUB>, R<SUB>2</SUB>, R<SUB>4</SUB>, and R<SUB>5</SUB> are selected so that there is at least one primary amine group and at least one secondary or tertiary amine group in the compound, and (c) at least one corrosion inhibitor that is selected from 8-hydroxyquinoline and isomers thereof, benzotriazoles, catechol, monosaccharides, and polyhydric alcohols selected from mannitol, sorbitol, arabitol, xylitol, erythritol, alkane diols and cycloalkane diols.</p> |
