发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT, SEMICONDUCTOR ELEMENT, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT
摘要 <p>The object of the present invention is to provide a method of manufacturing a semiconductor element which can produce a semiconductor element provided with a semiconductor layer having a high carrier transport ability, a semiconductor element manufactured by the semiconductor element manufacturing method, an electronic device provided with the semiconductor element, and electronic equipment having a high reliability. In order to achieve the object, the present invention is directed to a method of manufacturing a semiconductor element having an anode 3, a cathode 5, and a hole transport layer 41 provided between the anode 3 and the cathode 5, the method comprising the steps of: a first step for forming layers 41' mainly comprised of a hole transport material having polymerizable groups X on the side of one surface of the anode 3 and on the side of one surface of the cathode 5, respectively, and a second step for obtaining the hole transport layer 41 by integrating the two layers 41' together by polymerizing the hole transport materials via a polymerization reaction through their polymerizable groups in a state that the layer 41' on the side of the anode 3 and the layer 41' on the side of the cathode 5 are made contact with each other.</p>
申请公布号 WO2006112537(A1) 申请公布日期 2006.10.26
申请号 WO2006JP308674 申请日期 2006.04.18
申请人 SEIKO EPSON CORPORATION;SHINOHARA, TAKASHI;SHINOHARA, YUJI;TERAO, KOICHI 发明人 SHINOHARA, TAKASHI;SHINOHARA, YUJI;TERAO, KOICHI
分类号 H01L51/40;H01L51/48;H01L51/56 主分类号 H01L51/40
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