Magnetron-driven atomization and sputtering coating process predetermines target atomization condition and modifies magnet array rotation

摘要

In a magnetron-driven atomization and sputtering coating process, the coating particles are directed at the substrate surface by an array of rotating magnets. In the process, the atomization condition of the target is first determined, and the magnetic array speed of rotation regulated accordingly. The atomization condition is determined in accordance with the residual service life.