VERFAHREN ZUR KORREKTUR EINER PHOTOMASKE DURCH KOMPENSIERUNG DES DEFEKTS

摘要

A method for repair of amplitude and/or phase defects in lithographic masks. The method involves modifying or altering a portion of the absorber pattern on the surface of the mask blank proximate to the mask defect to compensate for the local disturbance (amplitude or phase) of the optical field due to the defect.