发明名称 FIELD-EFFECT TRANSISTOR HAVING PERPENDICULAR ELECTRODE AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a field-effect transistor having a perpendicular electrode and a manufacturing method thereof. <P>SOLUTION: A planar memory device and vertically oriented thin body devices are formed on a common semiconductor layer in a semiconductor device and a manufacturing method of the semiconductor device. For example, it is desirable that a memory device has a planar transistor in a surrounding region around the device and the vertically oriented thin body transistors in the cell region of the device. This allows the merits in each form of the device to be applied to each suitable function of the memory device. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006295180(A) 申请公布日期 2006.10.26
申请号 JP20060107587 申请日期 2006.04.10
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIM SUNG-MIN;PARK DONG-GUN;KIN DOUIN;KIM MIN-SANG;YUN EUN-JUNG
分类号 H01L27/088;H01L21/8234;H01L21/8242;H01L21/8244;H01L21/8247;H01L27/08;H01L27/108;H01L27/11;H01L27/115;H01L29/41;H01L29/423;H01L29/49;H01L29/78;H01L29/786;H01L29/788;H01L29/792 主分类号 H01L27/088
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