IMPRINT APPARATUS, SYSTEM, AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide an imprint apparatus, at the time of circuit pattern formation, which can imprint and easily release a substrate by aligning the substrate and the sequential pressurization, and which can be used for the large area substrate, and to provide a system and a method.

SOLUTION: The system and the method comprises: an imprint apparatus including a pattern section in which a circuit pattern is formed; a hot table separated only by the predetermined distance from the pattern section; an approach start sensor which is arranged at the substrate approach portion of the hot table and detects the approach start of the substrate; an approach finalization sensor which is arranged at the substrate discharging portion of the hot table and detects the approach finalization of the substrate; and an imprint finalization sensor which is separated only the predetermined distance from the approach finalization sensor and detects the imprint finalization.

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