| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device capable of processing large-sized object to be processed like a board having a diameter of not less than 300 mm, capable of generating uniform plasma with low plasma potential and high density. <P>SOLUTION: The plasma processing device is composed of a plasma generation chamber 1 hoising a substance to be processed, a flux path structural body 5 having at least a pair of end faces 5a, 5b facing each other, an antenna coil 11 wound around the flux path structural body 5, and a high frequency generation source supplying high frequency current to the antenna coil 11. The plasma generation chamber 1 is arranged between the end faces 5a, 5b. <P>COPYRIGHT: (C)2007,JPO&INPIT |
