DEVICE AND METHOD FOR APPLICATION OF AN EVEN THIN FLUID LAYER TO SUBSTRATES

摘要

The invention relates to a device (10), for application of an even thin fluid, namely phosphoric acid, layer to silicon cells (12) for photovoltaic application, provided with a process chamber (14), with a fluid trough (16) and a high-frequency ultrasound device (11) for conversion of the fluid into a fluid mist (15) and with a transport device (13) for the silicon cells (12) arranged below the fluid mist dropping shaft (25) of the process chamber (14). According to the invention, such a device (10) permitting a more homogeneous application of fluid to the relevant silicon cells with relation to both the surface and the amount applied, may be achieved, whereby the fluid mist dropping shaft (25) of the process chamber (14) has a tapering of the open cross-section thereof in the direction of the transport device (13) and opens out in a through shaft arrangement (40) for the substrates (12) covering the transport device (13) and the open cross-sections of the opening of the fluid mist dropping shaft (25) and the through shaft arrangement (40) match each other and are preferably essentially the same.