| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material for forming a high-definition pattern having good strippability by specifying respective swelling degrees of a cured film obtained after exposure in a developer and in a stripping solution, and to provide a pattern forming apparatus equipped with the pattern forming material and a pattern forming method using the pattern forming material. <P>SOLUTION: The pattern forming material has at least a photosensitive layer on a support, wherein the photosensitive layer contains a polymerization inhibitor, a binder, a polymerizable compound and a photopolymerization initiator. The pattern forming material is characterized in that a cured film obtained after exposing the photosensitive layer has a swelling degree in an aqueous solution of pH 8-11 being ≤50% and a swelling degree in an aqueous solution of >pH 11 being ≥20%. The pattern forming apparatus is equipped with the pattern forming material. The pattern forming method includes exposing the pattern forming material. <P>COPYRIGHT: (C)2007,JPO&INPIT |
