发明名称 |
METHOD FOR EVALUATING PERFORMANCE AND EXPOSURE METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for evaluating performance of an exposure device with high precision. <P>SOLUTION: Only primary components such as a scaling component, an offset component and a rotary component included in the superposition error of a plurality of mark images included simultaneously in the exposure slit in a scanning exposure device are extracted as components related to the performance of the exposure device and other components are removed as components unrelated to the performance of the exposure device such as deformation of a wafer. An index value of variation in primary components is employed as the performance evaluation value of the exposure device. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2006294852(A) |
申请公布日期 |
2006.10.26 |
申请号 |
JP20050113287 |
申请日期 |
2005.04.11 |
申请人 |
NIKON CORP |
发明人 |
NAKAJIMA SHINICHI;KANATANI YUHO;IRIUCHIJIMA YASUHIRO |
分类号 |
H01L21/027;G01B11/00;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|