发明名称 METHOD FOR EVALUATING PERFORMANCE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for evaluating performance of an exposure device with high precision. <P>SOLUTION: Only primary components such as a scaling component, an offset component and a rotary component included in the superposition error of a plurality of mark images included simultaneously in the exposure slit in a scanning exposure device are extracted as components related to the performance of the exposure device and other components are removed as components unrelated to the performance of the exposure device such as deformation of a wafer. An index value of variation in primary components is employed as the performance evaluation value of the exposure device. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006294852(A) 申请公布日期 2006.10.26
申请号 JP20050113287 申请日期 2005.04.11
申请人 NIKON CORP 发明人 NAKAJIMA SHINICHI;KANATANI YUHO;IRIUCHIJIMA YASUHIRO
分类号 H01L21/027;G01B11/00;G03F7/20 主分类号 H01L21/027
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