| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently expose a substrate having a large exposure region to exposure light in a stable state by using a small mask. <P>SOLUTION: A substrate 4 being conveyed in a fixed direction at a constant speed by a substrate conveying means 5 is irradiated with exposure light from a lamp 9 (continuous light source) through an aperture 11a of a mask 11 disposed in an exposure optical system 3 to transfer an image of the aperture 11a onto the substrate 4. In this process, a pixel (reference pattern) 18 preliminarily formed on the substrate 4 is photographed by an imaging means 6; when the photographed pixel 18 is moved from the imaging position F to an exposure start position K, the mask 11 is started to move in the proceeding direction (1) as synchronized with conveyance of the substrate 4, and irradiation of the substrate 4 with exposure light is simultaneously started; when the pixel 18 is moved to an exposure stop position J, irradiation of the substrate 4 with the exposure light is stopped and movement of the mask 11 is simultaneously stopped and returned to the exposure start position K; and these operations are repeated. <P>COPYRIGHT: (C)2007,JPO&INPIT |
