发明名称 |
PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCTURED STRUCTURAL MEMBER BY THE AID OF SUCH A PROJECTION EXPOSURE SYSTEM AND POLARIZATION-OPTICAL ELEMENT ADAPTED FOR USE IN SUCH A SYSTEM |
摘要 |
The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source (18) for producing light in the EUV region. The projection exposure system further comprises a first optical system (19, 20, 21, 22, 23, 24) for illuminating a mask (25) by the light of the light source (18) and a second optical system (26, 27, 28, 29, 30, 31) for imaging the mask (25) on a component (32). At least one polarization-optical element (1) is disposed on the beam path between the light source (18) and the component (32). |
申请公布号 |
WO2006111319(A2) |
申请公布日期 |
2006.10.26 |
申请号 |
WO2006EP03401 |
申请日期 |
2006.04.12 |
申请人 |
CARL ZEISS SMT AG;MANN, HANS-JUERGEN;SINGER, WOLFGANG;GRUNER, TORALF;DITTMANN, OLAF;TOTZECK, MICHAEL |
发明人 |
MANN, HANS-JUERGEN;SINGER, WOLFGANG;GRUNER, TORALF;DITTMANN, OLAF;TOTZECK, MICHAEL |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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