CYNOADAMANTYL COMPOUND AND POLYMERS AND PHOTORESISTS COMPRESING SAME
摘要
Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 run.
申请公布号
WO2005086901(A3)
申请公布日期
2006.10.26
申请号
WO2005US07910
申请日期
2005.03.08
申请人
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C.;BAE, YOUNG, C.;KAVANAGH, ROBERT, J.