APPLICATION METHOD, APPLICATION APPARATUS, AND PRODUCTION METHOD OF PHOTOMASK BLANK

摘要

PROBLEM TO BE SOLVED: To provide an application method suitable for quickly and easily making the thickness of a coating film to be formed on a substrate even. SOLUTION: The application method is carried out using an application apparatus 10 for applying a coating liquid to an object face 28 of a substrate 28 and forming a coating film by bringing the coating liquid arriving at the tip end opened part of a nozzle 82 of an application system 30 into contact with the object face 28 and relatively moving the substrate 28 and the nozzle 82 to scan the face. In the method, the relative scanning movement speed of the substrate 28 with the nozzle 82 is altered and corrected in a manner that the thickness of the coating film to be formed on coating regions in the object face of the substrate along the scanning direction is kept in a prescribed range based on the correlation between the scanning speed at the time of relatively moving the substrate 28 and the nozzle 82 for scanning the face and the thickness of the formed coating and the data of the thickness of previously formed coating for the respective coating regions along the scanning direction and the coating liquid is applied at the scanning speed corrected in the described manner. COPYRIGHT: (C)2007,JPO&INPIT