发明名称 METHOD OF FORMING PARTICULATE FILM
摘要 PROBLEM TO BE SOLVED: To provide a method of forming a particulate film enabling formation of a particulate film in a more uniformly oriented state. SOLUTION: The method comprises forming a particulate film consisting of particulate assembled in a self-organizing way, on a substrate. In the method, a substrate 1 is immersed in a particulate dispersion 13 dispersed with particulate in a dispersing medium. The concentration of particulate is higher than 5 wt.%, preferably 10 wt.% or higher. A liquid film 15 of the particulate dispersion 13 is formed on the surface of the substrate 1 by pulling up the substrate 1 from the particulate dispersion 13 into a gas phase at a pulling-up rate of 0.1-10 mm/sec. The dispersion medium is evaporated from the liquid film. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006289165(A) 申请公布日期 2006.10.26
申请号 JP20050109371 申请日期 2005.04.06
申请人 SONY CORP 发明人 AKAO HIROTAKA;TODA ATSUSHI
分类号 B05D1/18;B05D3/12 主分类号 B05D1/18
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