| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a base agent for a photosensitive resin composition which adds suitable hardness, elasticity and excellent durability and chemical resistance and has excellent curability and developability, and also to provide a photosensitive resin composition using the same. <P>SOLUTION: A resin which has an ethylenic unsaturated group with a group represented by formula (I), -OCOCH(R<SP>1</SP>)CH<SB>2</SB>SR<SP>2</SP>(where R<SP>1</SP>is a hydrogen atom or a methyl group and R<SP>2</SP>is a 1-12C hydrocarbon group with 1 or 2 carboxy groups) is provided. The base agent for the photosensitive resin composition contains the above resin having an ethylenic unsaturated group. Also, the photosensitive resin composition contains the base agent containing the resin having an ethylenic unsaturated group with the group represented by formula (I), a polyfunctional monomer and a photo polymerization initiator. <P>COPYRIGHT: (C)2007,JPO&INPIT |
