发明名称 THIN FILM DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus which can suppress a change in the state of the magnetic field more even when the space between a substrate and a target is changed, and can highly accurately set the space between the substrate and the target. SOLUTION: A solenoid retaining member 19 is provided on an outer circumference of a chamber 11 vertically movably, and an external solenoid 20 is wound around the solenoid retaining member 19. An opposing plate 21 is provided on an outer periphery of a base part 12b of a support 12, and a lower side plate 19b of the solenoid holding member 19 and the opposing plate 21 are connected to each other by a connection member 22. With this configuration, when a space H is changed, the external solenoid 20 can be vertically moved integrated with the support 12, and the positional relationship between an internal magnetic field generation unit 18 and the external solenoid 20 as an external magnetic field generation unit can be always maintained constant. Further, the space H can be changed by vertically moving only a target 13, then, the space H can be highly accurately set. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006291262(A) 申请公布日期 2006.10.26
申请号 JP20050111493 申请日期 2005.04.08
申请人 ALPS ELECTRIC CO LTD 发明人 KAGEYAMA ATSUSHI;FUKUDA KOICHI;TSUJIMURA MASAYUKI
分类号 C23C14/46;C23C14/35 主分类号 C23C14/46
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