NORBORNENE-TYPE POLYMER, COMPOSITION THEREOF AND LITHOGRAPHIC PROCESS USING THE SAME COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide norbornene-type polymers useful for immersion lithographic processes for producing microelectronic devices, to provide a method for producing the polymers and to provide a composition composed of the polymers.

SOLUTION: A non-self imageable and an imageable norbornene-type polymers are useful for the immersion lithographic processes. The method for producing the norbornene-type polymers is provided. The composition using the norbornene-type polymers is provided. The immersion lithographic processes use the norbornene-type polymer composition. The norbornene-type polymers useful for forming an imaging layer and a top-coat layer for overlaying the imaging layer in the immersion lithographic processes are provided. Furthermore, the immersion lithographic processes are provided.

COPYRIGHT: (C)2007,JPO&INPIT