| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing method of cover glass with a spacer for removing easily exposed adhesive exposed on a glass substrate and an etching mask on the spacer after dry etching with high yield at low cost, in a manufacturing step of the cover glass with the spacer to be assembled in a solid state imaging device. SOLUTION: By using a horizontal barrel type plasma ashing device 50 in which the axial direction of a cylindrical chamber 51 is set horizontally, the cover glass 3 with a spacer is supported horizontally in the chamber 51. At the same time, each plasma straightening plate 52 vertically to the axial line 51A of the chamber for straightening the flow of plasma is set upright with a space, which is almost equal to the inner diameter D of the chamber 51 while the cover glass 3 with the spacer is put between each straightening plate 52. COPYRIGHT: (C)2007,JPO&INPIT
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