SEMICONDUCTOR SUBSTRATE PROCESSING EQUIPMENT, EQUIPMENT AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide semiconductor substrate processing equipment, and equipment and method for cleaning a semiconductor substrate. SOLUTION: The equipment for producing a semiconductor substrate comprises a processing chamber for containing at least one semiconductor substrate and processing the semiconductor substrate by using processing liquid, and a section for activating the processing liquid by forming an electric field in a processing liquid channel. COPYRIGHT: (C)2007,JPO&INPIT