| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a newly technical means having simple configuration and easy operation capable of mechanically applying a polishing pad on upper and lower surface plates in a double sided polishing device by using a pressure roller. <P>SOLUTION: The pressure roller 20A composed of a cylindrical roller body 21 and a roller shaft 22 rotatably supporting the roller body 21 is mounted on a device body through a support mechanism 25. When applying a pad to surface plates 1, 2, the pressure roller 20A is radially interposed between the upper and lower surface plates 1, 2 by the position operation with the support mechanism 25. The roller body 21 is driven to rotate by rotating the upper and lower surfaces 1, 2 in the reverse direction with each other to press and attach the polishing pad 5 to the applying surfaces 1a, 2a of the pad by the rotating roller body 21. <P>COPYRIGHT: (C)2007,JPO&INPIT |
