发明名称 UNDERFILL DISPENSE AT SUBSTRATE APERTURE
摘要 <p>An IC assembly (10) having a die mounted on a substrate (16) with a gap therebetween, receives underfill material (12) through an aperture (32) provided in the substrate to fill the gap. This provides a favorable flow rate and improved underfilling, with less voiding. Embodiments of the invention are disclosed in which capillary action, a vacuum, or positive pressure, are used to assist the flow of underfill material.</p>
申请公布号 WO2006113754(A2) 申请公布日期 2006.10.26
申请号 WO2006US14631 申请日期 2006.04.19
申请人 TEXAS INSTRUMENTS INCORPORATED;ODEGARD, CHARLES, ANTHONY;COWENS, MARVIN, WAYNE;STIBOREK, LEON 发明人 ODEGARD, CHARLES, ANTHONY;COWENS, MARVIN, WAYNE;STIBOREK, LEON
分类号 H01L21/00 主分类号 H01L21/00
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