| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method for calibrating such an apparatus. <P>SOLUTION: The lithographic apparatus includes an object support configured to support an object. The lithographic apparatus further includes X, Y and Z interferometer measurement systems, and an object support positioning system configured to position the object support in a number of degrees of freedom on the basis of measurements of the interferometer measurement systems. A calibration device is configured to measure the Ry of the object support with the X interferometer measurement system in at least two different Z positions, measure the Ry of the object support with the Z interferometer measurement system in at least two different Z positions, calibrate the linear Z dependency of the Ry on the basis of the measurements, and calibrating the linear X dependency of Z on the basis of the previous calibration. Similarly, the linear Y dependency of Z is calibrated. <P>COPYRIGHT: (C)2007,JPO&INPIT |
