发明名称 METHOD FOR MANUFACTURING PEROVSKITE OXIDE LAYER, METHOD FOR MANUFACTURING FERROELECTRIC MEMORY AND METHOD FOR MANUFACTURING SURFACE WAVE ELASTIC WAVE ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a perovskite oxide layer, a method for manufacturing a ferroelectric memory and a method for manufacturing a surface wave elastic wave element, wherein an interface with an electrode layer is excellent. <P>SOLUTION: The method for manufacturing the perovskite oxide layer contains the steps of forming a first oxide layer 22 composed of perovskite oxide on a substrate 10; forming a second oxide layer 24 composed of at least one layer of a perovskite oxide layer crystallized at a lower temperature than a crystallization temperature of the first oxide layer 22 on the first oxide layer 22, and a pyrochlore layer having the same element as the perovskite oxide; forming an electrode layer 30 on the second oxide layer 24; and making a heat treatment. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006295065(A) 申请公布日期 2006.10.26
申请号 JP20050117217 申请日期 2005.04.14
申请人 SEIKO EPSON CORP 发明人 KIJIMA TAKESHI
分类号 H01L21/316;H01L21/8246;H01L27/105;H01L41/18;H01L41/187;H01L41/22;H01L41/318;H01L41/319;H01L41/39;H01L41/43 主分类号 H01L21/316
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