发明名称 |
Ruthenium compound and process for producing a metal ruthenium film |
摘要 |
A ruthenium compound from which high-quality film-like metal ruthenium can be obtained and a process for producing a metal ruthenium film from the ruthenium compound by chemical vapor deposition. The ruthenium compound as a material for chemical vapor deposition is represented by the following formula (1), for example.
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申请公布号 |
US2006240190(A1) |
申请公布日期 |
2006.10.26 |
申请号 |
US20050537484 |
申请日期 |
2005.06.03 |
申请人 |
JSR CORPORATION |
发明人 |
SAKAI TATSUYA;HASHIMOTO SACHIKO;MATSUKI YASUO |
分类号 |
C07F17/00;C07C51/00;C23C16/00;C23C16/18 |
主分类号 |
C07F17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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