发明名称 Ruthenium compound and process for producing a metal ruthenium film
摘要 A ruthenium compound from which high-quality film-like metal ruthenium can be obtained and a process for producing a metal ruthenium film from the ruthenium compound by chemical vapor deposition. The ruthenium compound as a material for chemical vapor deposition is represented by the following formula (1), for example.
申请公布号 US2006240190(A1) 申请公布日期 2006.10.26
申请号 US20050537484 申请日期 2005.06.03
申请人 JSR CORPORATION 发明人 SAKAI TATSUYA;HASHIMOTO SACHIKO;MATSUKI YASUO
分类号 C07F17/00;C07C51/00;C23C16/00;C23C16/18 主分类号 C07F17/00
代理机构 代理人
主权项
地址