发明名称 FIELD-EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a field-effect transistor improving a driving current at the on-time of a gate electrode with a drain current at the off-time of the gate electrode suppressed. SOLUTION: The field-effect transistor comprises a semicondcutor substratum, a gate insulating film provided on the semiconductor substratum, a gate electrode provided on the semiconductor substratum through the gate insulating film, and a source region and a drain region provided on both sides of the gate electrode of the semiconductor substratum. The area of the part sandwiching a channel-forming region and facing the drain region is smaller than that of the part sandwiching the channel-forming region and facing the source region. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006294995(A) 申请公布日期 2006.10.26
申请号 JP20050115998 申请日期 2005.04.13
申请人 NEC CORP 发明人 TAKEUCHI KIYOSHI;HANE MASAMI
分类号 H01L29/786;H01L21/336;H01L21/8234;H01L27/08;H01L27/088;H01L29/78 主分类号 H01L29/786
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