| 摘要 |
The invention provides a pellicle frame which can readily be peeled off after being adhesively attached to a photomask, and a photolithographic framed pellicle which makes use of this pellicle frame. The pellicle frame provided by the invention is a rectangular framework body of which the longer side framework member has a length of at least 500 mm, wherein at least one cavity is provided on the outside surface of any framework member at a distance of 50 mm or smaller from a corner of the frame. It is preferable that at least five cavities are provided on the outside surfaces of the pellicle frame, and the cavities each have a cylindrical configuration having a diameter in the range from 1.0 mm to 3.0 mm and a depth of at least 0.5 mm, but not deep enough to penetrate the framework member through. The framed pellicle is constructed by using this pellicle frame.
|
