发明名称 PHASE CHANGE MEMORY DEVICES EMPLOYING CELL DIODES AND METHODS OF FABRICATING THE SAME
摘要 <p>A phase change memory device and its manufacturing method are provided to improve the degree of integration by self-aligning cell diodes and phase changeable material patterns with each other using cell diode holes of a predetermined interlayer dielectric. A first interlayer dielectric(14) is formed on a semiconductor substrate(10). A plurality of cell diode holes(14h) are formed through the first interlayer dielectric. First and second semiconductor patterns(16n,16p) are sequentially formed within each cell diode hole. A cell diode electrode(18) is formed on the second semiconductor pattern. A confined phase changeable material pattern(24a) for filling the cell diode hole is formed on the cell diode electrode. An upper electrode(26a) is formed on the confined phase changeable material pattern.</p>
申请公布号 KR20060110559(A) 申请公布日期 2006.10.25
申请号 KR20050032898 申请日期 2005.04.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, JAE HYUN;OH, JAE HEE;LEE, SE HO;JEONG, WON CHEOL
分类号 H01L27/115 主分类号 H01L27/115
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