| 摘要 |
An exposure apparatus for exposing a substrate (26) to light via an original plate (20) includes a projection optical system (21) configured to project a pattern of the original plate onto the substrate, a liquid immersion mechanism (28) configured to generate a liquid immersion state in which the gap between the projection optical system and the substrate is filled with liquid (27) , a first photosensor (24) configured to detect light which has passed through the projection optical system, and a controller (5) configured to calibrate an output from the first photosensor (24) in the liquid immersion state based on a first output from the first photosensor (24) in the liquid immersion state, a second output from the first photosensor (24) in a non liquid immersion state, and a third output from a reference illuminometer (23) for detecting light which has passed through the projection optical system in the non liquid immersion state.
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