Particle inspection apparatus and method, exposure apparatus, and device manufacturing method

摘要

An inspection apparatus for inspecting a surface of an object for a particle includes an irradiator (7) configured to irradiate the surface (1) with inspection light (14a), a first detector (3) configured to detect light scattered at the surface (1), and a shield (5) configured to limit an irradiation region of the inspection light (14a) emitted by the irradiator (7) within a limited region of the surface (1). The surface (1) is preferably a reticle (1) or a pellicle. The shield (5) is arranged as to limit the irradiation range of inspection light (14a) such that the inspection light (14a) is prevented from striking the edge portion or end face of the object (1) or reticle (1). The generation of diffracted light due to a pattern (20) drawn on the reticle (1) is prevented. The particle scattered light detection accuracy is improved.