发明名称 |
A PROCESS FOR PREPARING ORGANIC SILICATE POLYMER |
摘要 |
<p>The present invention relates to a low dielectric material essential for a next generation electric device such as a semiconductor device, with a high density and high performance. In detail, the present invention provides: a process for preparing an organic silicate polymer comprising a polymerization step in the absence of homogenizing organic solvents, of mixing and reacting organic silane compounds with water in the presence of a catalyst to hydrolyze and condense the silane compounds, that is thermally stable and has good mechanical and crack resistance properties; and a coating composition for forming a low dielectric insulating film; and a process for preparing a low dielectric insulating film using the organic silicate polymer prepared according to the process, and an electric device comprising the low dielectric insulating film prepared according to the process.</p> |
申请公布号 |
EP1328571(B1) |
申请公布日期 |
2006.10.25 |
申请号 |
EP20010974911 |
申请日期 |
2001.09.18 |
申请人 |
LG CHEM LTD. |
发明人 |
KO, MIN-JIN;MOON, MYUNG-SUN;SHIN, DONG-SEOK;KANG, JUNG-WON;NAM, HYE-YEONG |
分类号 |
C08G77/00;C08G77/02;C08G77/06;C08G77/50;C08J5/18;C08L83/00;C09D183/02;C09D183/04;H01B3/46;H01L21/312 |
主分类号 |
C08G77/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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