METHOD FOR MONITORING WAFER IN EXPOSURE PROCESS

摘要

A method for recognizing a wafer during exposing is provided to prevent an exposing error and to reduce mounting time of the wafer on exposing equipment by recognizing the wafer mounted on the exposing equipment with a bar code monitoring. A wafer(300) where a recognizing unit is attached is mounted on exposing equipment(10). Information of the wafer is collected from the recognizing unit of the wafer. The wafer is identified by using the collected information of the wafer. The wafer is exposed. The wafer is installed on an alignment unit(201) of the exposing equipment and an auxiliary alignment unit(100) that is installed before exposing. The information collection of the wafer and the auxiliary alignment of the wafer in the auxiliary alignment are simultaneously performed.