Method and device for manipulating particles in plasma

摘要

A method for manipulating particles in a plasma device (100) including at least one manipulator electrode (31, 32), comprises the steps of generating a plasma (1) and subjecting the manipulator electrode (31, 32) to a high frequency manipulation voltage for manipulating particles contained in the plasma (1), wherein at least one of a manipulation voltage frequency of the manipulation voltage and a plasma sheath resonance frequency of the plasma is adjusted so that both frequencies have a predetermined relationship. A plasma device (100) for carrying this method out is described.