Lithographic apparatus and device manufacturing method
摘要
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid (500) between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor (228) includes an array of outlets (224) configured to minimize vibrations.
申请公布号
EP1710630(A3)
申请公布日期
2006.10.25
申请号
EP20060251863
申请日期
2006.04.03
申请人
ASML NETHERLANDS B.V.
发明人
BECKERS, MARCEL;DONDERS, SJOERD NICOLAAS LAMBERTUS;HOOGENDAM, CHRISTIAAN ALEXANDER;JACOBS, JOHANNES HENRICUS WILHELMUS;TEN KATE, NICOLAAS;KEMPER, NICOLAAS RUDOLF;MIGCHELBRINK, FERDY;EVERS, ELMAR
